Polymat
Centro (uo)
Interuniversity Microelectronics Centre
Lovaina, BélgicaPublicaciones en colaboración con investigadores/as de Interuniversity Microelectronics Centre (3)
2010
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LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development
Proceedings of SPIE - The International Society for Optical Engineering
2006
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Comprehensive approach to MuGFET metrology
Proceedings of SPIE - The International Society for Optical Engineering
2005
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CD SEM calibration to TEM for accurate metrology of FINs in MuGFET devices
IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings