Polymat
Centro (uo)
Instituto de Microelectrónica de Barcelona
Barcelona, EspañaPublicaciones en colaboración con investigadores/as de Instituto de Microelectrónica de Barcelona (3)
2011
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Guided self-assembly of block-copolymer for CMOS technology: A comparative study between grapho-epitaxy and surface chemical modification
Proceedings of SPIE - The International Society for Optical Engineering
2010
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LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development
Proceedings of SPIE - The International Society for Optical Engineering
2009
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Protein patterning on the micro-and nanoscale by thermal nanoimprint lithography on a new functionalized copolymer
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures