New local electronic stopping model for the Monte Carlo simulation of arsenic ion implantation into (100) single-crystal silicon

1. Yang, S.-H.
2. Morris, S.
3. Tian, S.
4. Parab, K.
5. Tasch, A.F.
6. Echenique, P.M.
7. Capaz, R.
8. Joannopoulos, J.