New local electronic stopping model for the Monte Carlo simulation of arsenic ion implantation into (100) single-crystal silicon
- Yang, S.-H.
- Morris, S.
- Tian, S.
- Parab, K.
- Tasch, A.F.
- Echenique, P.M.
- Capaz, R.
- Joannopoulos, J.
Proceedings:
Materials Research Society Symposium - Proceedings
ISSN: 0272-9172
Year of publication: 1995
Volume: 389
Pages: 77-82
Type: Conference paper