Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrates

  1. Zhang, L.
  2. Patil, A.J.
  3. Li, L.
  4. Schierhorn, A.
  5. Mann, S.
  6. Gösele, U.
  7. Knez, M.
Aldizkaria:
Angewandte Chemie - International Edition

ISSN: 1433-7851

Argitalpen urtea: 2009

Alea: 48

Zenbakia: 27

Orrialdeak: 4982-4985

Mota: Artikulua

DOI: 10.1002/ANIE.200900426 GOOGLE SCHOLAR
Datuen iturria: Scopus