Impact of local structure on halogen ion migration in layered methylammonium copper halide memory devices

  1. Ray, A.
  2. Martín-García, B.
  3. Martinelli, A.
  4. Spirito, D.
  5. Locardi, F.
  6. Altamura, D.
  7. Giannini, C.
  8. Prato, M.
  9. Manna, L.
  10. Abdelhady, A.L.
Aldizkaria:
Journal of Materials Chemistry A

ISSN: 2050-7496 2050-7488

Argitalpen urtea: 2020

Alea: 8

Zenbakia: 34

Orrialdeak: 17516-17526

Mota: Artikulua

DOI: 10.1039/D0TA06248K GOOGLE SCHOLAR