Impact of local structure on halogen ion migration in layered methylammonium copper halide memory devices
- Ray, A.
- Martín-García, B.
- Martinelli, A.
- Spirito, D.
- Locardi, F.
- Altamura, D.
- Giannini, C.
- Prato, M.
- Manna, L.
- Abdelhady, A.L.
ISSN: 2050-7496, 2050-7488
Year of publication: 2020
Volume: 8
Issue: 34
Pages: 17516-17526
Type: Article