Impact of local structure on halogen ion migration in layered methylammonium copper halide memory devices

  1. Ray, A.
  2. Martín-García, B.
  3. Martinelli, A.
  4. Spirito, D.
  5. Locardi, F.
  6. Altamura, D.
  7. Giannini, C.
  8. Prato, M.
  9. Manna, L.
  10. Abdelhady, A.L.
Journal:
Journal of Materials Chemistry A

ISSN: 2050-7496 2050-7488

Year of publication: 2020

Volume: 8

Issue: 34

Pages: 17516-17526

Type: Article

DOI: 10.1039/D0TA06248K GOOGLE SCHOLAR