Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

  1. Kumar, C.S.
  2. Urbikain, G.
  3. De Lucio, P.F.
  4. Pérez-Salinas, C.
  5. De Lacalle, L.N.L.
  6. Fernandes, F.
Revue:
Journal of Materials Research and Technology

ISSN: 2214-0697,  2238-7854

Année de publication: 2024

Volumen: 32

Pages: 4456-4464

Type: Article

DOI: 10.1016/J.JMRT.2024.09.007 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus