Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

  1. Kumar, C.S.
  2. Urbikain, G.
  3. De Lucio, P.F.
  4. Pérez-Salinas, C.
  5. De Lacalle, L.N.L.
  6. Fernandes, F.
Aldizkaria:
Journal of Materials Research and Technology

ISSN: 2214-0697,  2238-7854

Argitalpen urtea: 2024

Alea: 32

Orrialdeak: 4456-4464

Mota: Artikulua

DOI: 10.1016/J.JMRT.2024.09.007 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus