Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

  1. Kumar, C.S.
  2. Urbikain, G.
  3. De Lucio, P.F.
  4. Pérez-Salinas, C.
  5. De Lacalle, L.N.L.
  6. Fernandes, F.
Revista:
Journal of Materials Research and Technology

ISSN: 2214-0697,  2238-7854

Any de publicació: 2024

Volum: 32

Pàgines: 4456-4464

Tipus: Article

DOI: 10.1016/J.JMRT.2024.09.007 GOOGLE SCHOLAR lock_openAccés obert editor
Font de les dades: Scopus