Engineering anisotropic magnetoresistance of Hall bars with interfacial organic layers

1. Park, J.H.
2. Ribeiro, M.
3. Pham, T.K.H.
4. Lee, N.J.
5. Eom, T.-W.
6. Jo, J.
7. Park, S.-Y.
8. Rhim, S.H.
9. Nakamura, K.
10. Yoo, J.-W.
11. Kim, T.H.