Investigating the lateral motion of SiGe islands by selective chemical etching

  1. Katsaros, G.
  2. Rastelli, A.
  3. Stoffel, M.
  4. Isella, G.
  5. Känel, H.v.
  6. Bittner, A.M.
  7. Tersoff, J.
  8. Denker, U.
  9. Schmidt, O.G.
  10. Costantini, G.
  11. Kern, K.
Revue:
Surface Science

ISSN: 0039-6028

Année de publication: 2006

Volumen: 600

Número: 12

Pages: 2608-2613

Type: Article

DOI: 10.1016/J.SUSC.2006.04.027 GOOGLE SCHOLAR

Objectifs de Développement Durable