Atomic layer deposition of Al203 and Ti02 multilayers for applications as bandpass filters and antireflection coatings

  1. Szeghalmi, A.
  2. Helgert, M.
  3. Brunner, R.
  4. Heyroth, F.
  5. Gösele, U.
  6. Knez, M.
Revue:
Applied Optics

ISSN: 1539-4522,  1559-128X

Année de publication: 2009

Volumen: 48

Número: 9

Pages: 1727-1732

Type: Article

DOI: 10.1364/AO.48.001727 GOOGLE SCHOLAR
La source de données: Scopus