Atomic layer deposition of Al203 and Ti02 multilayers for applications as bandpass filters and antireflection coatings

  1. Szeghalmi, A.
  2. Helgert, M.
  3. Brunner, R.
  4. Heyroth, F.
  5. Gösele, U.
  6. Knez, M.
Aldizkaria:
Applied Optics

ISSN: 1539-4522 1559-128X

Argitalpen urtea: 2009

Alea: 48

Zenbakia: 9

Orrialdeak: 1727-1732

Mota: Artikulua

DOI: 10.1364/AO.48.001727 GOOGLE SCHOLAR