Effect of N2 flow rate on the microstructure and electrochemical behavior of TaNx films deposited by modulated pulsed power magnetron sputtering
- Mendizabal, L.
- Bayón, R.
- G-Berasategui, E.
- Barriga, J.
- Gonzalez, J.J.
Revue:
Thin Solid Films
ISSN: 0040-6090
Année de publication: 2016
Volumen: 610
Pages: 1-9
Type: Article
