Effect of N2 flow rate on the microstructure and electrochemical behavior of TaNx films deposited by modulated pulsed power magnetron sputtering

  1. Mendizabal, L.
  2. Bayón, R.
  3. G-Berasategui, E.
  4. Barriga, J.
  5. Gonzalez, J.J.
Aldizkaria:
Thin Solid Films

ISSN: 0040-6090

Argitalpen urtea: 2016

Alea: 610

Orrialdeak: 1-9

Mota: Artikulua

DOI: 10.1016/J.TSF.2016.04.043 GOOGLE SCHOLAR

Garapen Iraunkorreko Helburuak

Datuen iturria: Scopus