Floquet engineering of magnetism in topological insulator thin films

  1. Liu, X.
  2. Fan, B.
  3. Hübener, H.
  4. De Giovannini, U.
  5. Duan, W.
  6. Rubio, A.
  7. Tang, P.
Revue:
Electronic Structure

ISSN: 2516-1075

Année de publication: 2023

Volumen: 5

Número: 2

Type: Article

DOI: 10.1088/2516-1075/ACCA58 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus