Tailoring the magnetization reversal in antidot nanostructures using lithographically engineered inhomogeneities

  1. Tripathy, D.
  2. Vavassori, P.
  3. Adeyeye, A.O.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2011

Volumen: 109

Número: 7

Type: Communication dans un congrès

DOI: 10.1063/1.3537948 GOOGLE SCHOLAR
La source de données: Scopus