Ferroelectric thin and thick films for microsystems

  1. Whatmore, R.W.
  2. Zhang, Q.
  3. Huang, Z.
  4. Dorey, R.A.
Revue:
Materials Science in Semiconductor Processing

ISSN: 1369-8001

Année de publication: 2002

Volumen: 5

Número: 2-3

Pages: 65-76

Type: Communication dans un congrès

DOI: 10.1016/S1369-8001(02)00085-9 GOOGLE SCHOLAR