Introducing a new radical trifluoromethylation reagent

  1. Sato, A.
  2. Han, J.
  3. Ono, T.
  4. Wzorek, A.
  5. Aceña, J.L.
  6. Soloshonok, V.A.
Revue:
Chemical Communications

ISSN: 1364-548X 1359-7345

Année de publication: 2015

Volumen: 51

Número: 27

Pages: 5967-5970

Type: Article

DOI: 10.1039/C5CC00905G GOOGLE SCHOLAR